Entrapment or capture vacuum pumps, which retain gas molecules by chemical or physical interaction on their internal surfaces. The following paper outlines the working principles of sputterion pumps. Ion pump an ion pump is a vacuum pump, where the pumped out gas is subjected to extensive ionization, and the positively charged ions that are. This is a picture of the sputter ion pump parts, not the assembled sputter ion pump. Pumping mechanisms in sputterion pumps low pressure. Ion pumps create a vacuum of 10 4 newtons per sq m, or 10 6 mm of mercury. Recent work has suggested that free radicals escaping from ion pumps can influence the results of some. That is, h2 is pumped in the walls of the anode cells by high energy neutral burial. The neg pump, coupled to a distributed sputterion pump sip mostly intended to pump residual argon and possibly methane constitutes the principal pumping system for the uhv regime, allowing routine operation in the low 1011 torr range. Ultrahigh vacuum exhaust device, vacuum exhaust method, and sputter ion pump download pdf info publication number jp3926206b2. The pumping mechanisms for reactive and inert gas species, as well as argon. The parts for the sputter ion pump were supplied by various companies.
This pump has a simple design with no moving parts to produce wear and vibration. A sputter ion pump consists basically of two electrodes, anode and cathode, and a magnet fig. Jp3926206b2 ultrahigh vacuum exhaust device, vacuum. Using the anode layer ion source from as an ion pump. The generic name sputter ion pump or ion getter pump comes from the fact that some of the gas molecules undergo ionization and cause sputtering of the sputtering agent.
It is the product of ulvacs extensive technological reserves and long track record of proven performance in the ultrahigh vacuum field. For a list of companies that supplied major parts or important services for huygens gcms, click here. Operating principle of sputter ion pumps ions from a gas discharge impinge on the cathode of an electrode system within the pump housing thereby sputtering the cathode material titanium, in conventional pumps. View and download varian 9191115 instruction manual online. The pumping mechanisms for reactive and inert gas species, as well as argon instability. Together with the getter and the sputter ion pump, the cryopump is the most prominent representative of the latter group. For the purposes of this laboratory, we will describe the operation of a single cell diode type sputterion vacuum pump. So in sputtering, the target material and the substrate is placed in a vacuum chamber. Capacities are available up to 14,000 cu ft per minute, with an operating pressure range of 102 torr to below 1011 torr. Pdf application of compact negsputter ion pump combination in. At high operating voltages, leakage currents, especially field emission currents, interfere with using the ion pump current as an indicator of pressure. Ulvacs acter pumps are designed for developing new elements acter elements with improved evacuation characteristics at ultrahigh and extremely high vacuum, and to optimize magnetic fields. The sputter ion pump combines mechanical, electrical, magnetic and chemical principles to permanently capture residual gas molecules in vacuum systems. Distributed sputterion pumps for use in low magnetic fields article pdf available in ieee transactions on nuclear science 263.
Ion pumps are shipped under vacuum to ensure ultra high vacuum cleanliness and to demonstrate the vacuum integrity of the ion pump. Each sputterion pump requires a control unit of an appropriate voltage level, polarity and current capacity. The full speed of the pump is developed in the pressure range from about 106 to 108 torr, although the. Because hydrogen is a dominant gas at the ultimate of a metal system, it is necessary to combine either a sublimation or a getter pump with the sputter ion pump in order to maintain efficient pumping. Capture gas ions when the positive ion strikes the cathode plate, that impact is called sputtering. This involves ejecting material from a target that is a source onto a substrate such as a silicon wafer. Pumping mechanisms in sputterion pumps low pressure operation.
An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which accelerates the ions into a solid electrode. Other articles where sputter ion pump is discussed. This material chemically reacts with the active gases to form stable compounds that are. A conventional sputter ion pump comprises a vacuum envelope housing, at least one cathode electrode, an anode electrode formed as a plurality of hollow cylindrical cells, and means for applying to. The pumping effect of sputter ion pumps is produced by sorption processes, which are released by ionised gas particles. Scroll, which soon became the ideal complement to sips in the higher range of pressure. The pumping speed is achieved by parallel connection of many individual penning cells. Various parameters, such as magnetic field, electrode voltage, operating pressure, pump history, electrode contamination and partial pressure of other gases are shown to have a major influence on the pumping speed for any given gas. Valve off the roughing pump, and start the sputter ion pump. The positive ion is forced out of the anode tube by the high voltage field at a high velocity toward the cathode plate. Sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. An ion pump also referred to as a sputter ion pump is a type of vacuum pump which operates by sputtering a metal getter.
Study of plasma and ion beam sputtering processes 1 the conversion of neutral particles into ions, electrons plasma. Sputterion pumps may be single or multiple cell types, and can be of diode or triode design. A conventional sputter ion pump comprises a vacuum envelope housing, at least one cathode electrode, an anode electrode formed as a plurality of hollow cylindrical cells, and means for applying to the anode a potential higher than that of the cathode. Application of compact negsputter ion pump combination in uhv system of hiaf article pdf available in vacuum 157 august 2018 with 90 reads how we measure reads. If the original documents are not available, the manufacturers catalog may have the information. The exponential dependence of field emission leakage current versus operating.
As with all gas capture pumps, the sputterion pump requires no backing pump, and does have a limited lifetime, based on its. Pdf distributed sputterion pumps for use in low magnetic. Pdf hiafbring, a new multipurpose accelerator facility of the high intensity heavyion accelerator facility project. This pumping occurs in a manner similar to that by which the inert gases are pumped. Application of compact negsputter ion pump combination in uhv system of hiaf. Miniature sputterion pump design considerations or. Sputter ion pumps are one type of pump used to create ultrahigh vacuum, and are used in many analyzers and accelerators. Modion is a compact, modular ion pump system with industrial, laboratory, and cuttingedge scientific applications. Ulvacs acter pumps were developed to enable single sputter ion pumps to create ultrahigh vacuum on the order of 1010 pa. They are designed for developing new elements acter elements with improved evacuation characteristics at ultrahigh and extremely high vacuum, and.
Record vessel pressure, and sputter ion pump power supply voltage and current as a. In all types of ion sources, the gas ions are produced by various types of gas discharge including electron collisions with gas atoms. Ion pumps operation and applications duniway stockroom. Background sputterion pumps sips are capture pumps. Ultrahigh vacuum exhaust device, vacuum exhaust method, and sputter ion pump jp3926206b2 en jp3926206b2 en. Hydrogen pumping by sputterion pumps and getter pumps. An ion pump is a type of vacuum pump which operates by sputtering a metal getter. Optimization of sputter ion pumps one of the main issues in the use of sputter ion. Apr 29, 2017 using the anode layer ion source from as an ion pump. Resputtering is reemission of the deposited material during the deposition process by ion or atom bombardment. Connect the high voltage cable to an ion pump controller with. Ideal vacuum agilent varian small vacion plus ion pump. Under ideal conditions, ion pumps are capable of reaching pressures as low as 10. These features make the sputter ion pump the preferred one for the use in accelerators and analysis equipment.
Excellent introductions to vacuum systemchapter s in viscous and transitional regimes can be. These parameters are best determined by consulting the user manual for the sputterion pump andor the control unit. Sputter ion pumps may be single or multiple cell types, and can be of diode or triode design. Pdf application of compact negsputter ion pump combination. For the purposes of this laboratory, we will describe the operation of a single cell diode type sputter ion vacuum pump. Ion pumpnoble pump is an ultrahigh vacuum pump which utilizes the gas adsorption properties of the cathode material sputtered by cold cathode discharge within a magnetic field and the continuous formation of active getter film by sputtering cathode material ti during collision with the cathode. Ion pumps typical operating cycle rough pump with clean technology turbo, trapped mechanical, sorption rough to pressure below 103 t0rr lower pressure saves time, extends life turn on ion pump control unit high voltage cycle power if necessary to avoid overheating valve off roughing pump walk away. Rotary planetary specimen stages are essential for ensuring even coatings on specimens with irregular surfaces. Always use high purity argon gas of the grade known as white spot this will ensure fast sputter rate and good pump down time. An ion pump also referred to as a sputter ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Sputter ion pump is one of the pumps used to generate ultra and extremelyhigh vacuum.
An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv. Theory of operation gamma vacuum, everything ion pump. A sputter ion pump is a device for producing very high vacuum conditions. Varian vacuum, now agilent vacuum has always been at the forefront of vacuum technology, setting industry standards since 1957, with the invention of the ion pump that made uhv possible. Ion pump a vacuum pump in which the scavenged gas is subjected to intense ionization and the positively charged ions that form are removed by an electric field. Miniature sputterion pump design considerations duniway. Ulvac has developed the acter series of sputter ion. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which allows the ions to accelerate into and be.
A detail treatment of the subject of capture pumps, including sips, is given else where. Evacuate the sputter ion pump and the vacuum vessel to a pressure of less than 20 microns 2 x102 torr. As a consequence, the application range for ion pumps became more clearly identified as uhv. The general requirements are a source of electrons, a small region. Ion pump article about ion pump by the free dictionary.
Jun 24, 2011 ion pump an ion pump is a vacuum pump, where the pumped out gas is subjected to extensive ionization, and the positively charged ions that are formed as a result are removed by an electric field. Use the supplied cable or a cable with the appropriate mating connector for your feedthrough. An overview of sputterion pump weight versus pumping speed will. Sputterion pump article about sputterion pump by the. Hydrogen in the pump walls and anodes limits the base pressure of the pump. Agilent, decided to develop dedicated ion pump solutions including controllers and all. Sputter ion pump models v20, v30, v60, v110, v140, v220, v270. A study has been performed to design a new sputter ion pump sip using adequate axisymmetric spindle magnetic field instead of dipole field, which reduces continuous loss of electrons plasma and confine them for longer time through magnetic mirror action. Ion pump sputter ion pump modion ion vacuum pumps by j.
The gst07l is a sputter ion pump controller which features sophisticated functions and highgrade reliability. Also, above about 2x104 torr, the discharge changes modes to a less confined form as the mean free path for charged particles and molecules decreases. Study of plasma and ion beam sputtering processes 129 of an ion source for a particular application should be made with due consideration of factors such as species and intensity capability, beam quality emittance and brightness, ionization efficiency, reliability,ease of operation, maintenance, and source lifetime. Modion ion vacuum pumps advanced ion pump technology. Performance is superior in comparison to diode pumps with differential cathodes and in comparison to conventional triode pumps. Cathode materials are ejected toward the anode tube and the ion chemically and physically reacts with the cathode.
Sputter ion pump ion pump an ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Except for the ion sources plasma chambers, the vacuum systems of accelerators operate in free molecular regime. Because hydrogen is a dominant gas at the ultimate of a metal system, it is necessary to combine either a sublimation or a getter pump with the sputterion pump in order to maintain efficient pumping. Pump the gaspurifying micromachined sputter ion pump microsip operates by sputtering titanium, bonding this titanium to gas molecules, and removing these molecules from the environment.
Pumping mechanisms in sputter ion pumps are quite different for different gasses, and as a consequences pumping speeds are different too. Specifications of sputter ion pump power supplies s. With nounverb tables for the different cases and tenses links to audio pronunciation and relevant forum discussions free. Occasionally, questions or problems about performance may arise and this. The pumping effect of sputterion pumps is produced by sorption processes, which are released by ionised gas particles.
Poly gate pmos mit opencourseware free online course. Ion pumps sputter ion pumps, getter ion pumps, penning pumps provide a clean, simple, low maintenance alternative for producing and maintaining high and ultrahigh vacuum. Hydrogen 150 to 200% methane 100% other lightweight hydrocarbons 80 to 120% oxygen 80% argon 30% helium 28% sputter ion pumps allow, based on the discharge current, the measurement of the pressure within the vacuum cham. Sputtered atoms ejected from the target have a wide energy distribution.
A voltage is applied between them so that the target is the cathode and the substrate is attached to the anode. A plasma is created by ionizing a sputtering gas generally a chemically inert, heavy gas like argon. The long term pumping of argon is very stable with this element. The pumping effect is based chiefly on gettering processes. Sputterion pump article about sputterion pump by the free. A sputterion pump consists basically of two electrodes, anode and cathode, and a magnet fig. Silver as a removable coating for scanning electron. With the addition of agilent complete line of oilfree, low vibration. Excellent introductions to vacuum systemchapter s in viscous and transitional regimes can be found in refs. The experimental results suggest that the geometrical.
311 1110 985 1545 382 1563 34 636 1409 850 131 1517 113 335 1550 733 1326 771 543 961 902 724 605 1531 959 312 56 24 215 1123 773 545 1097 549 1075 743 765 576 210 1358 591 1411 672